High-level FLR meetings

A suite of “home grown” high-level gatherings and processes is emerging in support of the Bonn Challenge, driven by the political will of countries and regional institutions.

In Africa, a high-level ministerial meeting was convened in July 2016 in Kigali. Similar gatherings in west and southern Africa are scheduled for late 2016 and 2017. In Latin America, meetings convened in El Salvador in 2015 and Panama in 2016; with additional meetings in Honduras in June 2017, Guatemala in 2018, and Cuba in 2019 on the horizon. The first Asia Regional Ministerial Meeting in South Sumatra, Indonesia took place in May 2017.

Regional FLR platforms

The African Forest Landscape Restoration Initiative (AFR100) and Initiative 20x20 have been launched in Africa and Latin America respectively, where they are fostering leadership and collaboration in support of forest landscape restoration and the Bonn Challenge as well as other targets and programmes. IUCN works closely with governments, WRI, The World Bank and other partners to support these processes. The first Regional Conference of AFR100 in October 2016 advanced the operationalisation of this initiative by taking stock, developing strategies, identifying country support needs, and developing options for coordination and implementation of the initiative.

In late 2019, ECCA30 - a country-led initiative to bring 30 million hectares of degraded and deforested landscapes into restoration in the Europe, the Caucasus and Central Asia by 2030 - will be launched. ECCA30 will serve as the mechanism to secure additional commitments and accelerate implementation of Bonn Challenge pledges and aims to support countries to receive international and regional recognition of their restoration ambitions connected to their domestic priorities and projects. Further, it will facilitate access to technical and financial support, and reinforce regional cooperation and capacity exchange on forest landscape restoration. ECCA30 is supported by IUCN, the World Bank, UNECE / FAO and WRI.